Martijn van Beurden

Electromagnetic and multi-physics modeling and computation Lab

We focus on developing fast, flexible and accurate computational methods for electromagnetics and multi-physics to model multi-domain systems. By combining analytical and numerical strategies, we create state-of-the-art techniques providing insight in the underlying mechanisms of complex and high-tech systems.

Research Profile

The Electromagnetic and Multi-Physics Modeling and Computation (EMPMC) lab is part of the electromagnetics group at Eindhoven University of Technology. The lab has a long-standing track record on developing modeling methods for electromagnetic scattering, with applications and research partners in industry and medicine. More recently, the research of the lab is being expanded to multi-physics phenomena in which one of the phenomena involved is electromagnetics. The EMPMC lab is chaired by prof.dr.ir. M. C. van Beurden.

RESEARCH TOPICS WITHIN THE EMPMC-LAB

Time-domain integral equations in electromagnetics

Electromagnetics is the physics behind the interaction of electromagnetic waves and materials and is utilized in some of the greatest technological improvements of the last decade, like mobile communication, MRI, and radar. The behavior of the electromagnetic waves around technology is rather difficult to predict, hence engineers use simulations to visualize the electromagnetics and adjust their designs accordingly. Today, small features in geometry and complicated wave-material interaction result in simulation times in the order days, weeks, or even months. Too long for an iterative design process. We research simulation techniques based on time-domain integral equations that have the potential to reduce simulation times for a wide variety of materials.

Electromagnetic inversion

Nowadays, society depends on electronic devices for work, transportation, communication, entertainment, and more. To further improve these devices in terms of a reduced power consumption or increased memory capacity, the core of these devices in the form of integrated circuits (ICs) need to be produced with even smaller structures and finer details. A crucial part within the fabrication process of ICs is accurate monitoring such that production defects can be detected and calibration of the fabrication process can be performed to mitigate these production effects for the next batch of ICs. Failure to do so may result in the production of faulty ICs. We developed computational techniques that are capable of accurately estimating the shape and material properties of these structures, representing the particular details of an IC, during the fabrication process. 

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Meet some of our Researchers

Assistant Professor

Bas de Hon

Full Professor

Martijn van Beurden

Assistant Professor

Roeland Dilz

Recent Publications

Our most recent peer reviewed publications

Contact

  • Visiting address

    Groene Loper 19
    Flux, floor 9 (9.069)
    5612 AP Eindhoven
    Netherlands

  • Postal address

    P.O. Box 513
    Department of Electrical Engineering
    5600 MB Eindhoven
    Netherlands

  • Secretary